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Comparative effectiveness of reactive ion etching plasma and ethylene oxide sterilization technology
- In: G38 - Manufacturing and good manufacturing practice IPS (part 2) on Wednesday, 5 September 2007, 13:00-15:30
- At: Beijing (China) (2007)
- Type: Presentations + Posters
- By: SILVA, Juliano (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
- Co-author(s): Bonato, Claudio (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
Moreira, Adit (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
Oliveira, Débora (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
Mansano, Ronaldo (Laboratory of Integrated Systems-EP/USP, São Paulo, Brazil)
Pinto, Terezinha (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil) - Abstract:
The low-temperature plasma systems have had a very broad range of applications ever since their discovery. Nowadays, plasma represents an increasingly popular alternative to ethylene oxide (EtO) to sterilize heat-sensitive medical instruments. In this work, studies were performed taking into account a plasma sterilization technology using a
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Last update 28 September 2023